Prof. Zhongyang Li, Wuhan University, China

李仲阳教授，武汉大学

Prof. Zhongyang Li received his B.S. degree in Optoelectronics from Tianjin University (China) in 2011, and a PhD degree in Electrical Engineering and Computer Science department from Northwestern University (US) in 2017. From 2017 to 2019, he was a Photolithography Development Engineer for emerging memory at Micron Technology (Boise, ID, US). In 2019, he has been recognized as National High-Level Young Talent and joined Wuhan University (China) as a full professor.

He has authored and co-authored >40 papers in peer-reviewed journals, with a cumulative impact factor of up to 450. His works have appeared in several high-impact journals, including Science, ACS Nano, Nano Letters, Advanced Functional Materials, Laser & Photonics Reviews, Small, Optica, etc. He has been recognized with National High-Level Young Talents, Hubei Outstanding Youth, Ryan Fellow from the International Institute of Nanotechnology, SPIE Optics+Photonics Education Award, IEEE Photonics Society Conference Award, etc.

李仲阳，武汉大学电子信息学院教授，博士生导师，副院长（挂职）。获得中组部国家高层次人才青年项目，主持国家重点研发计划项目、湖北省杰出青年项目，获国家优秀留学生“特别优秀奖”，国际纳米学会瑞恩会士，SPIE光学与光子学教育奖等。本科毕业于天津大学，博士毕业于美国西北大学。曾在美国阿贡国家实验室做访问研究学者，并在美国美光科技公司总部进行未来存储器的纳米级半导体光刻技术研发。致力于研究超表面在微纳尺度下的光场操控研究，以第一/共一/通讯作者在权威期刊 Science、Nano Letters、Advanced Functional Materials、Small、ACS Nano等上发表40余篇论文。累计期刊影响因子达450，引用2700余次。